Titanium-Niobium Alloy Thin Films at Substrate Temperature (100C,200C and 300C) using Field Emission Scanning Electron Microscopy
Aditi1, Anand. K. Tyagi2

1Aditi, Department of Applied Sciences, Punjab Technical University, Kapurthla (Punjab), India.
2Anad. K. Tyagi, Professor, Department of Applied Sciences, SBS State Technical Campus, Ferozpur (Punjab), India.
Manuscript received on 20 October 2019 | Revised Manuscript received on 25 October 2019 | Manuscript Published on 02 November 2019 | PP: 3943-3947 | Volume-8 Issue-2S11 September 2019 | Retrieval Number: B15340982S1119/2019©BEIESP | DOI: 10.35940/ijrte.B1534.0982S1119
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© The Authors. Blue Eyes Intelligence Engineering and Sciences Publication (BEIESP). This is an open access article under the CC-BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/)

Abstract: This study reports on microstructural characteristics of Titanium-Niobium thin films deposited by RF Magnetron sputtering on glass substrate as a function of substrate temperature. The salient features of Ti-Nb films have been investigated by using high quality images of Field emission scanning electron microscopy (FESEM) and EDX, which enables the study of the film microstructure, elemental composition and grain size. The grain size is found to be sensitive to the Nb content at all substrate temperatures studied for all compositions. Further, the Grain size also exhibited the composition dependence; it reduces drastically from 114 nm for alloy Ti90Nb10 to 21 nm for alloy Ti50Nb50. EDX analysis of the thin film samples validates their elemental composition.
Keywords: Ti-Nb Alloy, RF Magnetron Sputtering, Grain Size, Microstructure, FESEM.
Scope of the Article: Microwave Antenna